.png)
Kelvin Force Microscopy (KFM)
Surface Potential at the Nanoscale
Kelvin Force Microscopy (KFM) is a powerful technique in Atomic Force Microscopy (AFM) for mapping surface potential and work function variations with nanoscale resolution. This mode is critical for semiconductor, photovoltaic, and nanotechnology applications, offering insights into the electrical properties of materials.
Key Features
-
High Sensitivity: Resolve minute variations in surface potential and work function.
-
Nanoscale Precision: Achieve detailed mapping at sub-nanometer resolution.
-
Multimode Capability: Combine KFM with other AFM modes for comprehensive analysis.
-
Non-Destructive Imaging: Ideal for fragile or delicate samples.
-
Advanced Applications: Semiconductors, 2D materials, and organic electronics.
Applications of KFM
Molybdenum AFM Scan – KFM and Topography Comparison
This 20 µm AFM scan compares surface morphology (right: topography) with electrical potential distribution (left: KFM mode), providing detailed insights into the material's structure and properties.
Semiconductor Analysis
-
Map dopant distributions and device interfaces.
-
Analyze charge trapping and leakage mechanisms.
Photovoltaics Research
-
Evaluate surface potential in perovskite and organic solar cells.
-
Optimize materials for improved device efficiency.
Nanotechnology and Materials Science
-
Investigate 2D materials and nanoscale composites.
-
Study work function variations in advanced materials.
HD-KFM III: The Most Advanced Single-Pass KFM Mode
​
HD-KFM III™ brings cutting-edge capabilities to Kelvin Probe Force Microscopy. Designed exclusively for the Nano-Observer II AFM, it offers unmatched sensitivity and resolution in single-pass operation.
​
-
Single-Pass Operation: Simultaneously measure topography and surface potential, reducing measurement time and enhancing accuracy.
-
dC/dZ Measurements: Characterize local dielectric properties by analyzing the capacitance gradient with respect to tip-sample distance.
-
Lift Mode: Accurately measure surface potential while separating long-range electrostatic forces.
-
EFC (Electrical Field Compensation): Eliminate electrostatic interactions during MFM measurements for pure magnetic imaging.
Applications of HD-KFM III
-
Advanced photovoltaic research, including perovskite and organic solar cells.
-
High-precision work function analysis for semiconductor devices.
-
Nanoscale dielectric property mapping.
​​
Comparison: Standard KFM vs. HD-KFM III
HD-KFM III provides unparalleled precision and efficiency compared to standard KFM modes, making it the optimal choice for advanced nanoscale electrical characterization.
.png)