Nano-Observer II Advanced, Versatile Atomic Force Microscope
The Nano-Observer II is a cutting-edge Atomic Force Microscope (AFM) that combines flexibility, exceptional performance, and user-friendly operation. Designed for both advanced users and beginners, it offers a wide range of capabilities for nanoscale imaging and characterization.
ResiScope™ III Advanced Electrical Measurements for AFM
ResiScope™ III is our most advanced module for electrical measurements at the nanoscale, building upon the proven ResiScope™ technology with enhanced capabilities.
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Features
All ResiScope™ Capabilities:
AutoGain adjusted in real-time by ultra-fast Digital Signal Processor electronics
10 orders of magnitude range in current/resistance (50 fA to 1mA - 100 ohms to 1 Tohm)
Both highly conductive and highly isolating domains measured in same image without user adjustment
No logarithmic amplifiers/gains (Multiple linear gains)
Real-time current protective integrated system
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ResiScope™ III Enhancements:
Superior accuracy and reduced background noise
PFM + ResiScope simultaneous measurements
Full integration with NanoSolution software
Access to all new future features and updates
Enhanced compatibility with advanced AFM modesonductors, photovoltaics, and advanced materials science
HD-KFM™ III Advanced Surface Potential Measurements
HD-KFM™ III builds upon our proven HD-KFM™ technology, offering enhanced capabilities for precise surface potential measurements. This advanced module delivers superior resolution and new functionalities for comprehensive surface analysis.
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All HD-KFM™ Capabilities:
True non-contact mode measurement
Multi-frequency excitation
Precise surface potential measurements
Direct VCPD measurement
Real electrostatic gradient measurements
AM/FM modes available
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HD-KFM™ III Enhancements:
Enhanced resolution with better signal-to-noise ratio
The New Galaxy USB 24-bit low noise AFM controller
High quality built in lock-ins
Phase, PFM, EFM, KFM...
Key modes: HD-KFM and ResiScope for high-resolution imaging
AFM + optical coupling
The Nano-Observer II has an open design for integration of optical microscopy techniques (UV, IR, Raman, etc.), enabling enhanced light illumination for photovoltaic illumination.
AFM + Glove box
Exploring the properties of various materials often necessitates a controlled environment. A glove box ensures precise control of humidity or gas (e.g., Nâ‚‚, Ar), safeguarding sensitive samples—such as 2D materials, lithium, organic, or photovoltaic materials—from environmental influences.
Nano-Observer II Specifications​​
Scanner Specifications
XY Scan Range: 100 μm × 100 μm (±10%)
Z Range: 15 μm (±10%)
XY Resolution: < 0.1 nm
Z Resolution: < 0.05 nm
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Imaging Modes
Standard Modes: Contact, Resonant, Soft Intermittent Contact
Magnetic Modes: Magnetic Force Microscopy, Variable Magnetic Field Module
NanoMechanical Modes: Soft MEKA, Force Modulation, Nano-Indentation, Force Spectroscopy, Friction (LFM)
Electrical Modes (AC): HD-KFM III, Kelvin Force Microscopy (double-pass), Electrostatic Force Microscopy
Electrical Modes (DC): ResiScope™ III, Soft ResiScope, Conductive AFM, Scanning Microwave Impedance, Piezo Response Force Microscopy
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Electrical Measurements
ResiScope Range: 10² to 10¹² ohms
Voltage Range: ±10 V (adjustable)
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Controller & Data Acquisition
Controller Resolution: 24-bit
Built-in Lock-in Amplifier: Up to 6 MHz
Maximum Data Points: 8192 × 8192
Sample Stage
Sample Size: Up to 50 mm diameter
Sample Weight: Up to 100 g
Motorized Sample Approach: 20 mm range, 100 nm resolution
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Environmental Control
Temperature Range: -40°C to 300°C (with optional module)
Example of high resolution image in
X-y-z. Atomic steps on HOPG are visible.
Also periodic arrange of self-assembled monolayers of C36 at different orientations. Periodic pitch visible in the image corresponds with the C36 chain length around 4.5 nm
Cobalt alloy coating
MFM signals
Scan size 30x30µm
Nanotubes
Topography image of 500 nm obtained in Resonant Mode of a network of carbon nanotubes (5 nm width).
C36 Molecule
Example of high resolution image in
X-y-z. Atomic steps on HOPG are visible.
Also periodic arrange of self-assembled monolayers of C36 at different orientations. Periodic pitch visible in the image corresponds with the C36 chain length around 4.5 nm
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Various Application Fields
With Different Scan Modes
RESISCOPE : CURRENT & RESISTANCE MAPPING
ResiScope III
WHAT IS RESISCOPE ?
The ResiScope is a unique, true active and fast system able to measure Resistance over 10 decades with a high sensitivity and resolution. True fast auto ranging driven by Digital Signal Processor (DSP). It can be combined with several dynamic modes as MFM/EFM or KFM single pass providing several sample characterizations on the same scan area.
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Resistance & Current mapping over 10 orders of magnitude in one module and one pass
Current control
High sensitivity over the full range
Compatible with : Oscillating mode / AC mode
EFM / MFM
HD-KFM
HD-KFM - High Definition Kelvin Force Microscopy
hd-kfm
In addition to standard KFM, the Nano-Observer II can offer High Definition KFM mode to highly enhance the resolution and increase the sensitivity of the surface potential.
The Electric Field Cancelling is a technique to compensate in real time the electrostatic field between the tip and the sample to achieve a pure magnetic measurement (MFM)
A Breakthrough in AFM Technology for Comprehensive Sample Analysis
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The Soft-IC mode operates at lower frequencies than traditional AFM, allowing the probe tip to make controlled, intermittent contact with the sample surface. This precise Z-piezo movement maintains constant force during measurement before retracting to the next point, enabling accurate mechanical and electrical property measurements while minimizing sample damage. By combining the advantages of both contact and resonant AFM modes, Soft-IC excels at characterizing soft biological samples and abrasive materials without compromising measurement quality or sample integrity. Compatible with various probe tips, this versatile technique delivers quantitative data while protecting both sample and probe.
Soft MEKA (Soft IC + Mechanical measurement)
Soft Meka allows to obtain high resolution imaging of stiffness or adhesion. By setting a lift height higher than the adhesion force, tip can be totally disengaged from the surface and permit to obtain stiffness and adhesion from every measured point. In addition, the stiffness can be used in combination with a software module to calculate the Young modulus
Soft IC + Resiscope = Soft Resiscope
The Soft ResiScope is a specialized AFM technique engineered for precise electrical characterization of fragile conductive samples. During operation, the system executes controlled vertical movement and keeps the force constant during the current/resistance measurement so that a quantitative conductive measurement is performed. Unlike traditional contact mode ResiScope, the Soft ResiScope measures also quantitatively resistance and current, avoiding the effects of friction either on the tip or the sample.
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What sets this technique apart is its ability to deliver measurement quality comparable to traditional contact-mode AFM while extending these capabilities to delicate samples that would typically be damaged by continuous contact. This innovation bridges a critical gap in nanoscale electrical characterization, making previously challenging measurements routine and reliable.
Soft IC + PFM & Soft IC SThM
The Soft IC is also compatible with other AFM modes such as Scanning Thermal Microscopy(SThM) and Piezoresponse Force Mode (PFM) with similar benefits as Soft ResiScope, i.e. it avoids friction however it keeps the force constant during the thermal or piezoelectric measurement. It extends the capability to measure delıcate samples ın an easier and reliable manner.
Soft PFM
Measuring amplitude and phase signals for fragile samples.
Intermittent Contact mode + PFM
Soft SThM
Thermal conductivitymeasurements for delicate samples
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